Книга Atom Lithography Monsit Tanasittikosol

Atom Lithography

From Newtonian to Path integral approach

Автор: Monsit Tanasittikosol
Език: Английски език
Корици: С меки корици
Наличност: Външен склад
Изпращаме след 8-11 дни
45.00 88.02 лв
This book discusses two approaches used as the tools to study atom lithography. The book begins with...

Информация за книгата

Език
Английски език
Корици
Книга - С меки корици
Издадена
2010
страници
76
EAN
9783843371964
Enbook ID
07116200
Теглоt
130
Размери
150 x 220 x 5

Пълно описание

This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated.

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