Книга Atomic Layer Deposition Tommi Kaariainen

Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

Език: Английски език
Корици: С твърди корици
Издател: John Wiley & Sons Inc
Наличност: Външен склад
Изпращаме след 9-15 дни
209.86 410.46 лв
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf...

Информация за книгата

Език
Английски език
Корици
Книга - С твърди корици
Издадена
2013
страници
272
EAN
9781118062777
ISBN
1118062779
Enbook ID
04949772
Издател
Теглоt
582
Размери
240 x 164 x 25

Пълно описание

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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