Книга CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 Alexander A. DemkovBill TaylorH. Rusty HarrisJeffery W. Butterbaugh

CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

Език: Английски език
Корици: С твърди корици
Издател: Materials Research Society
Наличност: Външен склад
Изпращаме след 9-15 дни
121.93 238.48 лв
To address the increasing demands of device scaling, new materials are being introduced into convent...

Информация за книгата

Език
Английски език
Корици
Книга - С твърди корици
Издадена
2009
страници
194
EAN
9781605111285
ISBN
1605111287
Enbook ID
02060485
Теглоt
430
Размери
160 x 236 x 14

Пълно описание

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

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