Книга CMOS Plasma and Process Damage Kirk Prall

CMOS Plasma and Process Damage

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Автор: Kirk Prall
Език: Английски език
Корици: С меки корици
Издател: Springer, Berlin
Наличност: 50% вероятност
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116.59 228.03 лв
This book discusses the complex technology of building CMOS computer chips and covers some of the un...

Информация за книгата

Автор
Език
Английски език
Корици
Книга - С меки корици
страници
466
EAN
9783031890314
Enbook ID
52997933
Издател
Размери
155 x 235

Пълно описание

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.