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Engineering Surface Morphology

Name: Engineering Surface Morphology
Brand: VDM Verlag Dr. Müller
SKU: 9783836474399
Price: 61.23 EUR
Availability: InStock

At the Atomic Level with Applications in Electronic Materials

Автор: Valerian Ignatescu

Език:

Корици: С меки корици

Издател: VDM Verlag Dr. Müller

Наличност: Налично при издателя, по поръчка

Изпращаме след 17-27 дни

61.23 € 119.75 лв

The silicon (111) and (001) surfaces have wide technological importance. Control of the morphologies...

Информация за книгата

Автор

Valerian Ignatescu

Език

Английски език

Корици

Книга - С меки корици

Издадена

2008

страници

136

EAN

9783836474399

Enbook ID

06969850

Издател

VDM Verlag Dr. Müller

Теглоt

219

Размери

150 x 8 x 8

Пълно описание

The silicon (111) and (001) surfaces have wide technological importance. Control of the morphologies of these surfaces at the atomic level is vital for such applications as layer-by-layer growth of epitaxial overlayers or assembly of nano-scale devices. By creating large areas with no or widely spaced atomic steps on patterned silicon surfaces by ultra-high vacuum (UHV) annealing, surface structures generated by surface premelting can be analyzed by simple quenching. The early roughness variation as a function of temperature and the morphologies that develop close to the boundaries of etched craters on Si(111) during UHV processing were also studied. Two applications using the substrates processed by UHV annealing were described. First, MOS capacitors were built on three types of Si(111) surfaces viz. atomically flat surfaces, stepped surfaces cleaned in UHV, and normal, RCA cleaned wafer surfaces. As expected, the smoother the Si substrate, the lower is the leakage current. In another application, Si(111) substrates with regular arrays of atomic steps were used to induce azimuthal alignment of crystals in thin polycrystalline pentacene films.