Extreme Ultraviolet Lithography

Name: Extreme Ultraviolet Lithography
Brand: LAP Lambert Academic Publishing
SKU: 9783659827402
Price: 32.92 EUR
Availability: InStock

Principles and Basic Technologies

Автор: Hiroo Kinoshita

Език:

Корици: С меки корици

Издател: LAP Lambert Academic Publishing

Наличност: Външен склад

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This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL)....

Информация за книгата

Автор

Hiroo Kinoshita

Език

Английски език

Корици

Книга - С меки корици

Издадена

2016

страници

164

EAN

9783659827402

Enbook ID

12628271

Издател

LAP Lambert Academic Publishing

Теглоt

234

Размери

150 x 220 x 8

Пълно описание

This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node.

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Extreme Ultraviolet Lithography

Principles and Basic Technologies

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