High Dielectric Constant Materials

Name: High Dielectric Constant Materials
Brand: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
SKU: 9783540210818
Price: 342.68 EUR
Availability: InStock

VLSI MOSFET Applications

Автор: Howard Huff, David Gilmer

Език:

Корици: С твърди корици

Издател: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG

Наличност: Външен склад в ограничено количество

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342.68 € 670.22 лв

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving Int...

Информация за книгата

Автор

Howard Huff, David Gilmer

Език

Английски език

Корици

Книга - С твърди корици

Издадена

2004

страници

710

EAN

9783540210818

ISBN

3540210814

Enbook ID

05273715

Издател

Springer-Verlag Berlin and Heidelberg GmbH & Co. KG

Теглоt

2650

Размери

155 x 235 x 45

Пълно описание

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

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High Dielectric Constant Materials

VLSI MOSFET Applications

Информация за книгата

Пълно описание

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