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Книга Plasma Processes for Semiconductor Fabrication W. N. G. Hitchon

Plasma Processes for Semiconductor Fabrication

Автор: W. N. G. Hitchon
Език: Английски език
Корици: С твърди корици
Издател: Cambridge University Press
Наличност: Външен склад
Изпращаме след 9-15 дни
162.61 € 318.04 лв
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-cont...

Информация за книгата

Автор
W. N. G. Hitchon
Език
Английски език
Корици
Книга - С твърди корици
Издадена
1999
страници
232
EAN
9780521591751
ISBN
0521591759
Enbook ID
02036608
Издател
Cambridge University Press
Теглоt
650
Размери
180 x 259 x 18

Пълно описание

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.

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