Strained Layer Epitaxy: Volume 379

Name: Strained Layer Epitaxy: Volume 379
Brand: Materials Research Society
SKU: 9781558992825
Price: 27.29 EUR
Availability: PreOrder

Materials, Processing, and Device Applications

Автор: John C. BeanKeh-Yung ChengEugene A. FitzgeraldJudy Hoyt

Език:

Корици: С твърди корици

Издател: Materials Research Society

Наличност: Очаква се допечатка

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An interdisciplinary discussion of key materials issues and controversies in strained layer epitaxy...

Информация за книгата

Автор

John C. BeanKeh-Yung ChengEugene A. FitzgeraldJudy Hoyt

Език

Английски език

Корици

Книга - С твърди корици

Издадена

1995

страници

521

EAN

9781558992825

ISBN

1558992820

Enbook ID

02060045

Издател

Materials Research Society

Теглоt

886

Размери

155 x 234 x 33

Пълно описание

An interdisciplinary discussion of key materials issues and controversies in strained layer epitaxy is presented in this new volume from MRS. Research involving GeSi alloys and Si:C alloys are well represented. In the case of GeSi alloys, utilizing both strained and relaxed structures appears to be a strong component of the current research. Applications, devices and synthesis of improved relaxed and strained materials are featured. Special efforts to integrate the III-V and IV communities were also made during this symposium, and those efforts are reflected in the proceedings volume as well. Results on compositional graded layers in both the GeSi and III-V materials systems are presented. Topics include: general issues; ordering/low dimensional structures; characterization; device applications; growth of Si-based materials; and growth of compound semiconductors.

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Strained Layer Epitaxy: Volume 379

Materials, Processing, and Device Applications

Информация за книгата

Пълно описание

Може също да ви хареса

Клиенти, които купиха тази книга, купиха също